![Global CD uniformity measurement based on 15 points on a reticle. 5 The... | Download Scientific Diagram Global CD uniformity measurement based on 15 points on a reticle. 5 The... | Download Scientific Diagram](https://www.researchgate.net/publication/228765100/figure/fig1/AS:393697448480782@1470876194585/Global-CD-uniformity-measurement-based-on-15-points-on-a-reticle-5-The-upper-left-image.png)
Global CD uniformity measurement based on 15 points on a reticle. 5 The... | Download Scientific Diagram
![CD uniformity at pitch 80nm after a/litho and b/etch for negative tone... | Download Scientific Diagram CD uniformity at pitch 80nm after a/litho and b/etch for negative tone... | Download Scientific Diagram](https://www.researchgate.net/publication/252117794/figure/fig9/AS:647164170620946@1531307370429/CD-uniformity-at-pitch-80nm-after-a-litho-and-b-etch-for-negative-tone-development.png)
CD uniformity at pitch 80nm after a/litho and b/etch for negative tone... | Download Scientific Diagram
![CD uniformity over the image field (range) versus focus for 0.25 µm... | Download Scientific Diagram CD uniformity over the image field (range) versus focus for 0.25 µm... | Download Scientific Diagram](https://www.researchgate.net/publication/267979085/figure/fig6/AS:669495924379672@1536631675761/CD-uniformity-over-the-image-field-range-versus-focus-for-025-m-dense-lines-for.png)
CD uniformity over the image field (range) versus focus for 0.25 µm... | Download Scientific Diagram
![Across Wafer Critical Dimension Uniformity Enhancement Through Lithography and Etch Process Sequence: Concept, Approach, Modeling, and Experiment | Semantic Scholar Across Wafer Critical Dimension Uniformity Enhancement Through Lithography and Etch Process Sequence: Concept, Approach, Modeling, and Experiment | Semantic Scholar](https://d3i71xaburhd42.cloudfront.net/6d519a329039a90ad29b863f696392f1caa41bec/6-Figure8-1.png)
Across Wafer Critical Dimension Uniformity Enhancement Through Lithography and Etch Process Sequence: Concept, Approach, Modeling, and Experiment | Semantic Scholar
![Across Wafer Critical Dimension Uniformity Enhancement Through Lithography and Etch Process Sequence: Concept, Approach, Modeling, and Experiment | Semantic Scholar Across Wafer Critical Dimension Uniformity Enhancement Through Lithography and Etch Process Sequence: Concept, Approach, Modeling, and Experiment | Semantic Scholar](https://d3i71xaburhd42.cloudfront.net/6d519a329039a90ad29b863f696392f1caa41bec/9-Figure13-1.png)
Across Wafer Critical Dimension Uniformity Enhancement Through Lithography and Etch Process Sequence: Concept, Approach, Modeling, and Experiment | Semantic Scholar
Across Wafer Critical Dimension Uniformity Enhancement Through Lithography and Etch Process Sequence: Concept, Approach, Modelin
![Global CD uniformity measurement of target line width 75nm on wafer... | Download Scientific Diagram Global CD uniformity measurement of target line width 75nm on wafer... | Download Scientific Diagram](https://www.researchgate.net/publication/228765100/figure/fig2/AS:393697448480803@1470876194751/Global-CD-uniformity-measurement-of-target-line-width-75nm-on-wafer-level-Settings-l.png)
Global CD uniformity measurement of target line width 75nm on wafer... | Download Scientific Diagram
![a) Across wafer CD uniformity for 110 nm wide (nominal) feature after... | Download Scientific Diagram a) Across wafer CD uniformity for 110 nm wide (nominal) feature after... | Download Scientific Diagram](https://www.researchgate.net/publication/368540572/figure/fig2/AS:11431281120462955@1676518070736/a-Across-wafer-CD-uniformity-for-110-nm-wide-nominal-feature-after-lithography-RIE.png)
a) Across wafer CD uniformity for 110 nm wide (nominal) feature after... | Download Scientific Diagram
![CD Uniformity comparison of random contact windows with ArF and KrF... | Download Scientific Diagram CD Uniformity comparison of random contact windows with ArF and KrF... | Download Scientific Diagram](https://www.researchgate.net/publication/241507528/figure/fig3/AS:648235995648019@1531562913827/CD-Uniformity-comparison-of-random-contact-windows-with-ArF-and-KrF-Conventional-OPC-vs.png)
CD Uniformity comparison of random contact windows with ArF and KrF... | Download Scientific Diagram
![Across Wafer Critical Dimension Uniformity Enhancement Through Lithography and Etch Process Sequence: Concept, Approach, Modeling, and Experiment | Semantic Scholar Across Wafer Critical Dimension Uniformity Enhancement Through Lithography and Etch Process Sequence: Concept, Approach, Modeling, and Experiment | Semantic Scholar](https://d3i71xaburhd42.cloudfront.net/6d519a329039a90ad29b863f696392f1caa41bec/7-Figure10-1.png)
Across Wafer Critical Dimension Uniformity Enhancement Through Lithography and Etch Process Sequence: Concept, Approach, Modeling, and Experiment | Semantic Scholar
![Global CD uniformity measurement based on 64 points on a test mask.... | Download Scientific Diagram Global CD uniformity measurement based on 64 points on a test mask.... | Download Scientific Diagram](https://www.researchgate.net/publication/228680594/figure/fig1/AS:301985854181390@1449010446804/Global-CD-uniformity-measurement-based-on-64-points-on-a-test-mask-Settings-l-193nm.png)